Question 1
What are the basic characteristics of MEMS? Make a comparison between bulk micromachining and surface micromachining?
Question 2
What is a cleanroom classification? Calculate the number of particles land on a 4″ silicon wafer in class 100 cleanroom?
Question 4
What is a good definition of Photolithography? Describe all basic steps in photolithography process? what is the ultimate resolution of photolithography? Why do we need yellow light in photolithography cleanroom? Is this possible to do photolithography in a dark room? Why?
Question 5
0
Describe 3 main techniques for the fabrication of thin film.
a. Thermal evaporation
b. E-beam evaporation
c. Sputtering
Which one is the best for the step coverage? Why? How to reduce film contamination in deposition?
Question 6: How long does it take for depositing of a Si02 layer with a thickness of lmicromet on the Si (100) surface by different methods:
a- Thermal dry oxidation at 1000°C b- Thermal wet oxidation at 1000°C